J
Appl Phys 1998,84(11): 6023–6026.CrossRef 18. Hobbs RG, Petkov N, Holmes JD: Semiconductor nanowire fabrication by bottom-up and top-down paradigms. Chem Mater 2012,24(11): 1975–1991.CrossRef 19. Liu CY, Datta A, Liu NW, Peng CY, Wang YL: Order disorder transition of anodic alumina nanochannel arrays grown under the guidance of focused-ion-beam patterning. Appl Phys Lett 2004,84(14): 2509–2511.CrossRef 20. Chen B, Lu K, Tian Z: Understanding focused ion beam guided anodic alumina nanopore development. Electrochim Acta 2011,56(27): 9802–9807.CrossRef 21. Sun Z, Kim HK: Growth of ordered, single-domain, alumina nanopore arrays with holographically patterned aluminum films. Appl Phys Lett 2002,81(18): 3458–3460.CrossRef 22. Kim B, Park S, McCarthy BMN 673 purchase TJ, Russell TP: Fabrication of ordered anodic aluminum oxide using a solvent-induced array of block-copolymer micelles. Small 2007,3(11): 1869–1872.CrossRef 23. Lee W, Han H, Lotnyk A, Schubert MA, Senz S, Alexe M, Hesse D, Baik S, Gösele U: Individually addressable epitaxial ferroelectric nanocapacitor arrays with near Tb inch-2 density. Nat Nano 2008,3(7): 402–407.CrossRef 24. Lai KL, Hon MH, Leu IC: Fabrication of ordered nanoporous anodic https://www.selleckchem.com/products/c646.html alumina prepatterned by mold-assisted chemical etching. Nanoscale Res Lett 2011,6(1): 157.CrossRef 25. Fournier-Bidoz S, Kitaev V,
Routkevitch D, Manners I, Ozin GA: Highly ordered nanosphere imprinted nanochannel alumina (NINA). Adv Mater 2004,16(23–24): 2193–2196.CrossRef 26. Masuda H, Yamada H, Satoh M, Asoh H, Nakao M, Tamamura T: Highly ordered nanochannel-array architecture in anodic alumina. Appl Phys Lett 1997,71(19): 2770–2772.CrossRef 27. Lee W, Ji R, Ross CA, Gosele U, Nielsch K: Wafer-scale Ni imprint stamps for porous alumina membranes Rutecarpine based on interference lithography. Small 2006,2(8–9): 978–982.CrossRef
28. Kustandi TS, Loh WW, Gao H, Low HY: Wafer-scale near-perfect ordered porous alumina on substrates by step and flash imprint lithography. ACS Nano 2010,4(5): 2561–2568.CrossRef 29. Nasir ME, Allsopp DWE, Bowen CR, Hubbard G, Parsons KP: The fabrication of mono-domain highly ordered nanoporous alumina on a wafer scale by a guided electric field. Nanotechnology 2010, 21:105303.CrossRef 30. Robinson AP, Burnell G, Hu M, MacManus-Driscoll JL: NSC 683864 Controlled, perfect ordering in ultrathin anodic aluminum oxide templates on silicon. Appl Phys Lett 2007,91(14): 143123.CrossRef 31. Garidel S, Zelsmann M, Chaix N, Voisin P, Boussey J, Beaurain A, Pelissier B: Improved release strategy for UV nanoimprint lithography. J Vac Sci Technol B 2007,25(6): 2430–2435.CrossRef 32. Van Overmeere Q, Blaffart F, Proost J: What controls the pore spacing in porous anodic oxides? Electrochem. Comm 2010,12(9): 1174–1176.CrossRef 33. Thompson GE, Wood GC: Porous anodic film formation on aluminium. Nature 1981,290(5803): 230–232.CrossRef 34.